Rapid Thermal Processing
Image: Model RTP-1300
RTP (Rapid Thermal Processing
Ecopia’s RTP (Rapid Thermal Processor) is the ideal tool for heat
treatment on maximum 100mm wafer at very high speed. The system incorporates twelve halogen
lamps to ensure heat treatment on the sample is uniform.
Furthermore, it is very convenient to use and is offered at a reasonable and competitive
price, making it an ideal purchase for use in a university or laboratory.
Twelve halogen lamps (upper 6 pieces and
lower 6 pieces ) make uniform heating on sample.
Retains flatness of sample on the sample
Compact desktop design, reasonable price,
convenient to control.
Max sample size : Max. 4
inch (100mm) wafer.
Minimal pollution of chamber
Transparent quartz chamber
(Put the sample on the transparent Quartz
Temperature control part: Temperature control
by various programming.
Gas input (Purge
Chamber is cooled by flowing
Maximum temperature : Max.
1200℃ at vacuum status (10e-3 torr)
Max 300℃ at ambient air.
Pressure : Max 10exp-3
Ramping up rate : 1200dC/ 15sec.
Various gas flow